PHOTOCHEMICALLY-REMOVABLE SILYL PROTECTING GROUPS

Authors
PIRRUNG MC LEE YR
Citation
Mc. Pirrung et Yr. Lee, PHOTOCHEMICALLY-REMOVABLE SILYL PROTECTING GROUPS, Journal of organic chemistry, 58(25), 1993, pp. 6961-6963
Citations number
10
Categorie Soggetti
Chemistry Inorganic & Nuclear
Journal title
Journal of organic chemistry → ACNP
ISSN journal
00223263
Volume
58
Issue
25
Year of publication
1993
Pages
6961 - 6963
Database
ISI
SICI code
0022-3263(1993)58:25<6961:PSPG>2.0.ZU;2-5
Abstract
(Hydroxystyryl)dimethylsilyl (HSDMS) and (hydroxystyryl)diisopropylsil yl (HSDIS) reagents have been developed that readily protect primary a nd secondary alcohols and can be removed on irradiation with short wav elength light in polar solvent.