(AL)GAINP LASER WITH LATERAL CONFINEMENT BY EPITAXIAL-GROWTH ON NONPLANAR SUBSTRATES

Citation
Gl. Bona et al., (AL)GAINP LASER WITH LATERAL CONFINEMENT BY EPITAXIAL-GROWTH ON NONPLANAR SUBSTRATES, IEEE photonics technology letters, 5(10), 1993, pp. 1125-1128
Citations number
15
Categorie Soggetti
Optics,"Physics, Applied
ISSN journal
10411135
Volume
5
Issue
10
Year of publication
1993
Pages
1125 - 1128
Database
ISI
SICI code
1041-1135(1993)5:10<1125:(LWLCB>2.0.ZU;2-L
Abstract
Quantum-Well (Al)GaInP stripe lasers with lateral current and carrier confinement have been fabricated making use of the disordering of the natural superlattice at sidewalls with shallow angles during epitaxial growth on (001) GaAs substrates patterned with ridges and trenches. E xcellent device quality is obtained if the substrates are patterned wi th ridges. With a stripe width of 5 mum required for fundamental trans versal mode operation, the threshold current density of these devices is one-half that of conventional planar stripe lasers owing to improve d current confinement.