DIAMOND GROWTH ON TURBOSTRATIC CARBON BY HOT-FILAMENT CHEMICAL-VAPOR-DEPOSITION

Citation
Zm. Yu et al., DIAMOND GROWTH ON TURBOSTRATIC CARBON BY HOT-FILAMENT CHEMICAL-VAPOR-DEPOSITION, Journal of applied physics, 74(12), 1993, pp. 7235-7240
Citations number
41
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
74
Issue
12
Year of publication
1993
Pages
7235 - 7240
Database
ISI
SICI code
0021-8979(1993)74:12<7235:DGOTCB>2.0.ZU;2-X
Abstract
Diamond films were grown on turbostratic carbon (TC) pregrown on Cu su bstrates by hot filament chemical vapor deposition. Auger electron spe ctroscopy, Raman spectroscopy, x-ray diffraction, infrared absorption spectroscopy, and scanning electron microscopy were used to characteri ze both the TC and the diamond films. It was shown that the TC films c ould form on Cu at low temperatures (almost-equal-to 650-degrees-C) wi th the catalysis of Mo and that diamond crystallites rapidly formed on TC in less than 10 min at higher temperature (almost-equal-to 1000-de grees-C). The sp3 bonds were found to coexist with sp2 bonds in TC. Th e sp3 bonds in TC provide nucleation sites for diamond crystals and im prove the nucleation rate at the early stage of deposition of diamond on TC.