TEMPERATURE-MEASUREMENTS OF LT GAAS DIODES

Citation
R. Westphalen et al., TEMPERATURE-MEASUREMENTS OF LT GAAS DIODES, Materials science & engineering. B, Solid-state materials for advanced technology, 22(1), 1993, pp. 78-81
Citations number
9
Categorie Soggetti
Material Science","Physics, Condensed Matter
ISSN journal
09215107
Volume
22
Issue
1
Year of publication
1993
Pages
78 - 81
Database
ISI
SICI code
0921-5107(1993)22:1<78:TOLGD>2.0.ZU;2-Q
Abstract
We have grown ion temperature (LT) GaAs by molecular beam epitaxy in o rder to study its insulating properties. The LT GaAs exhibits trap fil led limited (TFL) conduction. The TFL conduction mechanism is correlat ed with the measurement of a double peak on X-ray diffraction patterns . Therefore, it is connected to the presence of an excess of arsenic. Diodes realized on LT GaAS were fabricated and measured from 77 K to r oom temperature. The dependence of the low field resistivity and the b reakdown voltage vs. temperature is analysed. The variation with the l ayer thickness is also shown. In contrast to diodes realized on GaAs g rown at higher temperature, the breakdown voltage exhibits excellent u niformity.