R. Westphalen et al., TEMPERATURE-MEASUREMENTS OF LT GAAS DIODES, Materials science & engineering. B, Solid-state materials for advanced technology, 22(1), 1993, pp. 78-81
We have grown ion temperature (LT) GaAs by molecular beam epitaxy in o
rder to study its insulating properties. The LT GaAs exhibits trap fil
led limited (TFL) conduction. The TFL conduction mechanism is correlat
ed with the measurement of a double peak on X-ray diffraction patterns
. Therefore, it is connected to the presence of an excess of arsenic.
Diodes realized on LT GaAS were fabricated and measured from 77 K to r
oom temperature. The dependence of the low field resistivity and the b
reakdown voltage vs. temperature is analysed. The variation with the l
ayer thickness is also shown. In contrast to diodes realized on GaAs g
rown at higher temperature, the breakdown voltage exhibits excellent u
niformity.