This paper presents the results of investigation of the propagation of
plasma flow in a plasma arc installation for vacuum coating depositio
n. The distribution of plasma arc flow parameters in longitudinal and
curvilinear magnetic fields is analysed. The dependence of the concent
ration of various atomic particles on the parameters of the vacuum arc
plasma was investigated by emission spectroscopy techniques. It was f
ound that in a vacuum arc jet the various elements comprising the cath
ode, and their isotopes, separate in the presence of a magnetic field.
The concentration of atomic particles-the products of molecular disso
ciation-depends on the arc penetrating current through the working cha
mber area. The plasma sheath created near the substrates under negativ
e bias potential was investigated. The criteria for the placement of f
ilters to capture droplets and their probabilistic efficiency were det
ermined for various filter geometries. The results of the application
of this process to coating deposition technology are discussed.