PROCESSES IN PLASMA-ARC INSTALLATION FOR VACUUM COATING DEPOSITIONS .2. PLASMA PROPAGATION

This paper presents the results of investigation of the propagation of plasma flow in a plasma arc installation for vacuum coating depositio n. The distribution of plasma arc flow parameters in longitudinal and curvilinear magnetic fields is analysed. The dependence of the concent ration of various atomic particles on the parameters of the vacuum arc plasma was investigated by emission spectroscopy techniques. It was f ound that in a vacuum arc jet the various elements comprising the cath ode, and their isotopes, separate in the presence of a magnetic field. The concentration of atomic particles-the products of molecular disso ciation-depends on the arc penetrating current through the working cha mber area. The plasma sheath created near the substrates under negativ e bias potential was investigated. The criteria for the placement of f ilters to capture droplets and their probabilistic efficiency were det ermined for various filter geometries. The results of the application of this process to coating deposition technology are discussed.