ADVANCES IN CATHODIC ARC TECHNOLOGY USING ELECTRONS EXTRACTED FROM THE VACUUM-ARC

Authors
Citation
J. Vetter et Aj. Perry, ADVANCES IN CATHODIC ARC TECHNOLOGY USING ELECTRONS EXTRACTED FROM THE VACUUM-ARC, Surface & coatings technology, 61(1-3), 1993, pp. 305-309
Citations number
12
Categorie Soggetti
Material Science
ISSN journal
02578972
Volume
61
Issue
1-3
Year of publication
1993
Pages
305 - 309
Database
ISI
SICI code
0257-8972(1993)61:1-3<305:AICATU>2.0.ZU;2-B
Abstract
The cathodic arc, as used in vacuum deposition equipment, generates a highly ionized metal vapor. In current industrial practice, this is us ed for heating and ion etching the substrate, as well as for the actua l deposition process. Electrons generated at the same time as the meta l ions can be used to modify and extend the process technology. This p aper discusses the basic physical principles of utilizing these electr ons through the application of subsidiary electrical fields. Three typ es of application are discussed: substrate heating by electron impact; ion sputter cleaning using gas ions generated with an arc-enhanced gl ow discharge; anodic evaporation of metals in reactive and non-reactiv e gas atmospheres.