LARGE-AREA COVERAGE OF HIGH T(C)YBA2CU3O7-X THIN-FILMS DEPOSITED WITHTHE ACTIVATED REACTIVE EVAPORATION TECHNIQUE

The ability to produce homogeneous large-area films is a prerequisite for the application of superconductors in passive devices such as quas i-optical bandpass filters or industrial-scale production on commercia l-size wafer substrates.This publication focuses on the large-area cov erage capabilities for the deposition of YBa2Cu3O7-x (YBCO) films via the activated reactive evaporation (ARE) technique. Various parameters (deposition rate, structure, composition, critical transition tempera ture etc.) will be presented as a function of substrate coverage. They demonstrate that ARE has the potential to achieve good large-area cov erage. Based on these results and after comparing them to the findings of other research teams, achievements and recommended improvements fo r optimized YBCO film deposition with the ARE technique will be discus sed from the viewpoint of processing technology.