STRUCTURAL CHARACTERISTICS OF ELECTRON-CYCLOTRON-RESONANCE CHEMICAL-VAPOR-DEPOSITION SIC COATINGS

Authors
QADRI SB SKELTON EF SHIMKUNAS AR BUTLER JE
Citation
Sb. Qadri et al., STRUCTURAL CHARACTERISTICS OF ELECTRON-CYCLOTRON-RESONANCE CHEMICAL-VAPOR-DEPOSITION SIC COATINGS, Surface & coatings technology, 61(1-3), 1993, pp. 346-348
Citations number
10
Categorie Soggetti
Material Science
Journal title
Surface & coatings technology → ACNP
ISSN journal
02578972
Volume
61
Issue
1-3
Year of publication
1993
Pages
346 - 348
Database
ISI
SICI code
0257-8972(1993)61:1-3<346:SCOEC>2.0.ZU;2-B
Abstract
SiC films 0.2-2.0 mum thick have been characterized structurally by X- ray diffraction techniques. The films were deposited by electron cyclo tron resonance-chemical vapor deposition techniques. No evidence of cr ystallinity was observed for films with thicknesses less than 1 mum; t hese are presumed to be amorphous. Thicker films were found to have cr ystallized predominantly in the a phase of SiC.