MULTIPLY-BONDED SILICON - MATRIX-ISOLATION AND CHEMICAL TRAPPING OF PRODUCTS OF PYROLYSIS AND PHOTOLYSIS OF TRIAZIDOPHENYLSILANE

Citation
Jg. Radziszewski et al., MULTIPLY-BONDED SILICON - MATRIX-ISOLATION AND CHEMICAL TRAPPING OF PRODUCTS OF PYROLYSIS AND PHOTOLYSIS OF TRIAZIDOPHENYLSILANE, Organometallics, 12(12), 1993, pp. 4816-4824
Citations number
30
Categorie Soggetti
Chemistry Inorganic & Nuclear","Chemistry Inorganic & Nuclear
Journal title
ISSN journal
02767333
Volume
12
Issue
12
Year of publication
1993
Pages
4816 - 4824
Database
ISI
SICI code
0276-7333(1993)12:12<4816:MS-MAC>2.0.ZU;2-P
Abstract
Triazidophenylsilane (1) yields phenyl isosilacyanide (3) upon irradia tion in matrix isolation and by pyrolysis followed by trapping in nobl e gas matrix. Annealing from 12 to 15 K causes significant changes in the IR spectrum of photochemically produced 3, attributed to the relea se of hydrostatic pressure in the matrix. The matrix reaction of pyrol ytically produced 3 with t-BuOH to yield an independently synthesized trapping adduct 4 has been followed spectrally. An aligned sample of 3 was produced by photoselection and polarized IR spectra were recorded . The UV and IR absorption spectra of 3 have been interpreted and agre e well with ab initio and semiempirical calculations. In contrast, the intermediacy of benzenesilonitrile (2), a representative of a so far unknown class of species with a -Si=N triple bond, in the photofragmen tation of matrix-isolated 1, is merely strongly suggested but not prov en by trapping of the photoproducts from matrix-isolated 1 with t-BuOH to yield the adduct 5 in addition to 4. The silonitrile 2 did not acc umulate in the matrix in amounts sufficient for spectral characterizat ion.