X-RAY-PRODUCTION - 13 NM FROM LASER-PRODUCED PLASMAS FOR PROJECTION X-RAY-LITHOGRAPHY APPLICATIONS

Citation
Rl. Kauffman et al., X-RAY-PRODUCTION - 13 NM FROM LASER-PRODUCED PLASMAS FOR PROJECTION X-RAY-LITHOGRAPHY APPLICATIONS, Applied optics, 32(34), 1993, pp. 6897-6900
Citations number
8
Categorie Soggetti
Optics
Journal title
ISSN journal
00036935
Volume
32
Issue
34
Year of publication
1993
Pages
6897 - 6900
Database
ISI
SICI code
0003-6935(1993)32:34<6897:X-1NFL>2.0.ZU;2-#
Abstract
X-ray production in the region approximately 13 nm from laser-produced plasmas has been investigated as a source for projection x-ray lithog raphy. The dependence of x-ray conversion efficiency on target materia l, intensity, and pulse length has been studied by using a 0.53-mum la ser with a maximum of 0.3 J. A conversion efficiency of 1% into a 0.3- nm bandwidth has been demonstrated for Sn targets at intensities of ap proximately 10(11) W/cm2 by using a 7.5-ns pulse. Intensity scaling su ggests that laser spot size and two-dimensional expansion are importan t for optimizing x-ray production at these low-irradiation intensities .