The design requirements for a compact electron storage ring that could
be used as a soft-x-ray source for projection lithography are discuss
ed. The design concepts of the x-ray optics that are required for coll
ecting and conditioning the radiation in divergence, uniformity, and d
irection to illuminate the mask correctly and the particular x-ray pro
jection camera used are discussed. Preliminary designs for an entire s
oft-x-ray projection lithography system that uses an electron storage
ring as a soft-x-ray source are presented. It is shown that, by combin
ing the existing technology of storage rings with large collection ang
le condensers, a powerful and reliable source of 130-angstrom photons
for production line projection x-ray lithography is possible.