INFLUENCE OF ELECTRICAL ISOLATION ON THE STRUCTURE AND REFLECTIVITY OF MULTILAYER COATINGS DEPOSITED ON DIELECTRIC SUBSTRATES

Multilayers prepared with electrically isolated or grounded surfaces d uring deposition are shown to have dramatically different hard-x-ray, soft-x-ray, and neutron reflectivity characteristics. The effect has b een observed for [100] silicon wafers, fused silica, and borate glass substrates of different sizes and with different surface roughness and flatness for multilayer structures prepared by rf and dc magnetron sp uttering.