UNDULATOR RADIATION FOR AT-WAVELENGTH INTERFEROMETRY OF OPTICS FOR EXTREME-ULTRAVIOLET LITHOGRAPHY

Authors
ATTWOOD D SOMMARGREN G BEGUIRISTAIN R NGUYEN K BOKOR J CEGLIO N JACKSON K KOIKE M UNDERWOOD J
Citation
D. Attwood et al., UNDULATOR RADIATION FOR AT-WAVELENGTH INTERFEROMETRY OF OPTICS FOR EXTREME-ULTRAVIOLET LITHOGRAPHY, Applied optics, 32(34), 1993, pp. 7022-7031
Citations number
40
Categorie Soggetti
Optics
Journal title
Applied optics → ACNP
ISSN journal
00036935
Volume
32
Issue
34
Year of publication
1993
Pages
7022 - 7031
Database
ISI
SICI code
0003-6935(1993)32:34<7022:URFAIO>2.0.ZU;2-#
Abstract
Techniques are described for at-wavelength interferometry of multilaye r coated optics designed for use in extreme-ultraviolet lithography. B roadly tunable undulator radiation, which covers the spectral region f rom 45 to 400 angstrom, is described. The coherent power available at these wavelengths is described, and several types of interferometer th at might be suitable at these short wavelengths are also described.