CURRENT EFFICIENCY AND CRYSTALLIZATION MECHANISM IN PULSE PLATING OF HARD CHROMIUM

Citation
P. Leisner et al., CURRENT EFFICIENCY AND CRYSTALLIZATION MECHANISM IN PULSE PLATING OF HARD CHROMIUM, Journal of Applied Electrochemistry, 23(12), 1993, pp. 1232-1236
Citations number
9
Categorie Soggetti
Electrochemistry
ISSN journal
0021891X
Volume
23
Issue
12
Year of publication
1993
Pages
1232 - 1236
Database
ISI
SICI code
0021-891X(1993)23:12<1232:CEACMI>2.0.ZU;2-V
Abstract
The current efficiency of chromium deposition was investigated under c onditions of periodic current reversal. It has been demonstrated that the relationship between the anodic and the cathodic charges, Q(a)/Q(c ), has a strong influence on the current efficiency and the structure of the deposit. A plausible model for the crystallization mechanism du ring periodic current reversal has been suggested. According to the mo del, an advantageous chromium structure is maintained during the depos ition process because interstitial hydrogen in the chromium lattice is oxidized during the anodic period.