LOW-TEMPERATURE PREPARATION OF SRTIO3 THIN-FILMS

SrTiO3 thin films were prepared at very low temperature (<200 degrees C) by a simple chemical process. The precursor solution was prepared i n methoxy ethanol starting from strontium hydroxide and titanium isopr opoxide. Using this solution, thin films were deposited by spin coatin g on different substrates. X-ray diffraction of the as-dried films as well as the powders obtained by evaporating the solution confirmed the formation of stoichiometric crystalline SrTiO3 material at these low temperatures. The sheet resistance of the films was measured and found to be 10(14) Ohm square(-1) for a 1 mu m thickness. The initial resul ts on these films suggest their suitability as barrier layers in MIS a nd SIS devices.