SrTiO3 thin films were prepared at very low temperature (<200 degrees
C) by a simple chemical process. The precursor solution was prepared i
n methoxy ethanol starting from strontium hydroxide and titanium isopr
opoxide. Using this solution, thin films were deposited by spin coatin
g on different substrates. X-ray diffraction of the as-dried films as
well as the powders obtained by evaporating the solution confirmed the
formation of stoichiometric crystalline SrTiO3 material at these low
temperatures. The sheet resistance of the films was measured and found
to be 10(14) Ohm square(-1) for a 1 mu m thickness. The initial resul
ts on these films suggest their suitability as barrier layers in MIS a
nd SIS devices.