SYNTHESIS OF OXIDE LAYERS ON SILICON POLYDIOXIDE BY MOLECULAR DEPOSITION WITH METHOXYL FUNCTIONAL-GROUPS

Citation
Vm. Smirnov et al., SYNTHESIS OF OXIDE LAYERS ON SILICON POLYDIOXIDE BY MOLECULAR DEPOSITION WITH METHOXYL FUNCTIONAL-GROUPS, Journal of applied chemistry of the USSR, 65(12), 1992, pp. 2213-2217
Citations number
15
Categorie Soggetti
Chemistry Applied
ISSN journal
0021888X
Volume
65
Issue
12
Year of publication
1992
Part
1
Pages
2213 - 2217
Database
ISI
SICI code
0021-888X(1992)65:12<2213:SOOLOS>2.0.ZU;2-V
Abstract
The surface chemical reactions of the methoxyl functional groups of si lica with TiCl4 and SnCl4 were investigated. The possibility of using silicon polydioxide (dispersed silica) in synthesis by molecular depos ition of methoxyl groups (-OCH3) was investigated during the synthesis of SnO2 layers.