THE MIDRANGE AND HIGH-TEMPERATURE DEPENDENCE OF VACUUM-DEPOSITED NICRTHIN-FILM RESISTORS

Authors
PELED A FARHADYAN J ZLOOF Y BARANAUSKAS V
Citation
A. Peled et al., THE MIDRANGE AND HIGH-TEMPERATURE DEPENDENCE OF VACUUM-DEPOSITED NICRTHIN-FILM RESISTORS, Vacuum, 45(1), 1994, pp. 5-10
Citations number
20
Categorie Soggetti
Physics, Applied
Journal title
Vacuum → ACNP
ISSN journal
0042207X
Volume
45
Issue
1
Year of publication
1994
Pages
5 - 10
Database
ISI
SICI code
0042-207X(1994)45:1<5:TMAHDO>2.0.ZU;2-F
Abstract
The resistance-temperature dependence of NiCr Thin Film Resistors (TFR ) has been measured in the whole temperature range -60-degrees-C to 21 0-degrees-C. This specific TFR system and temperature range is of grea t importance for hybrid microelectronics technology and also for theor etical modelling of electron transport in metals and high temperatures . The empirical data is compared to well-known conduction processes in order to account for the observed resistance of non-linear behaviour as a function of temperature.