Thin In films on Ge(100), Si(100) and Si(111) are investigated using A
uger-electron spectroscopy (AES), atomic force microscopy (AFM) and pe
rturbed gammagamma-angular correlation (PAC) spectroscopy, respectivel
y. The growth mode of the metal films is characterized by in situ AES
measurements, indicating distinct differences between the different su
bstrate surfaces. Additional AFM investigations are used to monitor th
e film topography at higher metal coverage. Finally, the local crystal
line structure of the films is studied by the PAC technique.