Wg. Spanninga et L. Niesen, OBSERVATION OF A STRUCTURAL PHASE-TRANSITION IN A COSI2 LAYER BURIED IN [111]SI, Hyperfine interactions, 79(1-4), 1993, pp. 663-668
Single crystalline multilayered structures of Si/CoSi2/Si < 111 > made
by high dose implantation of Co in a Si wafer were investigated with
Co-57 source Mossbauer spectroscopy, channeling measurements and X-ray
diffraction. The results point to a structural phase transition in th
e CoSi2 buried layer between 180 and 220 K.