CALCULATIONS OF INDUSTRIAL PHYSICAL VAPOR-DEPOSITION COATING CONDITIONS EXAMINED IN RELATION TO (CR, TI)N DEPOSITION

The mathematical treatment of substrate rotations in a given arrangeme nt for physical vapour deposition permitted the calculation of time-de pendent variations of vapour fluxes and appropriate growth rates at a defined substrate position. The frequency of these oscillations can be directly related to superpositioned substrate rotations. Additionally , the appearance of a beat frequency could be proved. The examination of these results was performed for element concentrations in (Cr,Ti)N coatings. High frequency element oscillations with expected spacings o f 3 nm did not appear in glow discharge optical spectroscopy and Auger electron spectroscopy depth profiles. An indication of the calculated concentration beat frequency could be proved experimentally.