HARDWARE AND SOFTWARE FOR IN-SITU PROCESS MONITOR AND CONTROL USING MULTIPLE WAVELENGTH ELLIPSOMETRY

Authors
JOHS B DOERR D PITTAL S WOOLLAM JA
Citation
B. Johs et al., HARDWARE AND SOFTWARE FOR IN-SITU PROCESS MONITOR AND CONTROL USING MULTIPLE WAVELENGTH ELLIPSOMETRY, Surface & coatings technology, 62(1-3), 1993, pp. 680-682
Citations number
5
Categorie Soggetti
Materials Science, Coatings & Films
Journal title
Surface & coatings technology → ACNP
ISSN journal
02578972
Volume
62
Issue
1-3
Year of publication
1993
Pages
680 - 682
Database
ISI
SICI code
0257-8972(1993)62:1-3<680:HASFIP>2.0.ZU;2-0
Abstract
We have built and tested a low-cost ellipsometer which acquires data i n the spectral range 400-800 nm at multiple (up to 44) wavelengths sim ultaneously in less than 1 s. A personal computer is used to acquire d ata and analyze the data in real time for studies of time dependent ph enomena. In addition, this permits feedback control which we have demo nstrated on epitaxial growth of CdTe on GaAs by metal organic chemical vapor deposition.