M. Itsumi et J. Kai, 4 TYPES AND ORIGINS OF TRANSIENT SI WAFER DEFORMATION WITH FURNACE INSERTION AND WITHDRAWAL, JPN J A P 1, 32(12A), 1993, pp. 5468-5472
Several types of transient deformations (200-1000 mum) of silicon wafe
rs, observed when the wafers are inserted into or withdrawn from a hot
horizontal furnace, are shown to be due to small asymmetries (2-10 mu
m) in the actual wafer shapes. Saddle-type deformation during the inse
rtion process is categorized in two types along axes which are at righ
t angles. The type of deformation depends on a small difference (asymm
etry) between the extent of deformation in two crystallographically eq
uivalent (100) directions with the same Young's modulus. During withdr
awal, two kinds of bowl-type deformations (concave and convex) are obs
erved. This is also due to small inherent deformations (asymmetry) in
the original wafers.