IMPROVEMENT OF DOSE UNIFORMITY IN LARGE EXPOSURE FIELD FOR SYNCHROTRON-RADIATION LITHOGRAPHY

We have developed a new exposure method which provides both high X-ray intensity and dose uniformity in a large exposure field for synchrotr on radiation (SR) lithography. This method uses a scanning mirror meth od and electron beam wobbling in combination in SR beamlines. The adva ntage of this method was confirmed experimentally in a 25-mm-square ex posure field. In addition, simulation results show that dose uniformit y of less-than-or-equal-to +/-2% can be achieved in a 50-mm-square exp osure field.