G. Prasad et On. Srivastava, FLASH ANNEALING - A NEW PROCESS FOR ENHANCING THE CONVERSION EFFICIENCY OF N-WSE2 SINGLE-CRYSTAL-BASED PHOTOELECTROCHEMICAL SOLAR-CELLS, Semiconductor science and technology, 8(12), 1993, pp. 2161-2167
The present paper reports a new process called 'flash annealing' for t
he enhancement of solar to electrical conversion efficiency (eta) for
n-WSe2 single-crystal-based photoelectrochemical (PEC) solar cells. Th
e flash annealing process involves annealing of the as-grown n-WSe2 cr
ystals at a predetermined high temperature (750 +/- 10-degrees-C) for
very short times (1 2 min) in a dynamic vacuum followed by a rapid que
nching to room temperature. Improvements in photovoltage (e.g. from 18
0 mV to 600 mV) and fill factor (e.g. from 0.33 to 0.60) have been inv
ariably observed. These results have been compared with another mode o
f annealing in which n-WSe2 crystals are subjected to long-time furnac
e annealing (at 750 +/- 10-degrees-C for 1 h). Evaluation Of XRD patte
rns before and after flash annealing revealed an increase in the inten
sity of the 001 lines and a decrease in peak full width at half maximu
m (FWHM). However, in the case of long-time annealing, the intensity o
f the 001 lines is found to decrease. On the other hand, the FWHM Of X
RD peaks remained almost the same as before annealing. These results h
ave been explained on the basis of Fermi level depinning for n-WSe2 si
ngle-crystal photoelectrodes (n-WSe2/I-, I3-) after flash annealing, T
he flash annealing process is expected to decrease the density of bulk
imperfections because thermal stresses (due to non-uniform heating) a
re set up which act to drive away the bulk imperfections. In the case
of prolonged annealing, however, due to uniform heating, thermal stres
ses are absent and consequently the density of bulk imperfections is n
ot expected to change.