Y. Liu et al., IMPROVED GAAS ALAS MULTILAYER STRUCTURES GROWN BY MBE ON PATTERNED GAAS (100) SUBSTRATES WITH RIDGES ALONG THE [001] DIRECTION/, Semiconductor science and technology, 8(12), 1993, pp. 2197-2200
GaAs/AlAs multilayer structures were grown by MBE on patterned GaAs (1
00) substrates with submicrometre-width ridges in conventional [011BAR
] and new [001] directions, and their cross-sectional structures were
investigated by TEM. On the [001] ridges, {110} side facets with very
good morphology were formed on both sides of the (100) terrace, in con
trast with the rather poor morphology of {311} A side facets for the c
onventional [011BAR] ridge case. GaAs quantum wire (QWR) structures (w
ith a triangular cross section, 26 nm wide by 18 nm high) surrounded b
y very flat AlAs {110} side facets and a (100) plane were formed on th
e top of the (100) terrace on the [001] ridges. This indicates that th
e [001] ridge pattern is highly desirable for fabricating high-quality
QWR structures. The migration length of Al atoms on the (100) plane d
uring MBE growth at 570-degrees-C was determined for the first time to
be 8 nm by TEM observation.