IMPROVED GAAS ALAS MULTILAYER STRUCTURES GROWN BY MBE ON PATTERNED GAAS (100) SUBSTRATES WITH RIDGES ALONG THE [001] DIRECTION/

Citation
Y. Liu et al., IMPROVED GAAS ALAS MULTILAYER STRUCTURES GROWN BY MBE ON PATTERNED GAAS (100) SUBSTRATES WITH RIDGES ALONG THE [001] DIRECTION/, Semiconductor science and technology, 8(12), 1993, pp. 2197-2200
Citations number
12
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Condensed Matter","Material Science
ISSN journal
02681242
Volume
8
Issue
12
Year of publication
1993
Pages
2197 - 2200
Database
ISI
SICI code
0268-1242(1993)8:12<2197:IGAMSG>2.0.ZU;2-0
Abstract
GaAs/AlAs multilayer structures were grown by MBE on patterned GaAs (1 00) substrates with submicrometre-width ridges in conventional [011BAR ] and new [001] directions, and their cross-sectional structures were investigated by TEM. On the [001] ridges, {110} side facets with very good morphology were formed on both sides of the (100) terrace, in con trast with the rather poor morphology of {311} A side facets for the c onventional [011BAR] ridge case. GaAs quantum wire (QWR) structures (w ith a triangular cross section, 26 nm wide by 18 nm high) surrounded b y very flat AlAs {110} side facets and a (100) plane were formed on th e top of the (100) terrace on the [001] ridges. This indicates that th e [001] ridge pattern is highly desirable for fabricating high-quality QWR structures. The migration length of Al atoms on the (100) plane d uring MBE growth at 570-degrees-C was determined for the first time to be 8 nm by TEM observation.