A method to study microhomogeneity of deep centres in high resistivity
and low resistivity semiconductors is described herein. It Uses measu
rements of current decay induced in Schottky diodes and p-n junctions
by a probing electron beam of an SEM and is closely related to a metho
d of photoelectron relaxation spectroscopy. The advantages of this met
hod are demonstrated for an example of dislocation-related inhomogenei
ty in semi-insulating GaAs.