ROOM-TEMPERATURE DEPOSITION OF DIAMOND-LIKE CARBON-FILMS BY THE MICROWAVE PLASMA-JET METHOD

Modifications have been incorporated in the conventional microwave-ass isted chemical vapour deposition process to deposit diamond-like carbo n (DLC) coatings on polycarbonate substrates. In the modified method, the substrates to be coated are placed outside the plasma chamber. An electric field is applied across the microwave discharge. The accelera ted ionic species leave the nozzle and bombard the substrates placed i n a separate chamber. Using the present technique, DLC films have been deposited on silicon and polycarbonate substrates. These films show c hemical inertness and hardness values in the range 15-19.5 GPa.