FORMATION OF OHMIC CONTACTS ON SEMICONDUCTING DIAMOND GROWN BY CHEMICAL-VAPOR-DEPOSITION

Citation
T. Iwasaki et al., FORMATION OF OHMIC CONTACTS ON SEMICONDUCTING DIAMOND GROWN BY CHEMICAL-VAPOR-DEPOSITION, DIAMOND AND RELATED MATERIALS, 3(1-2), 1994, pp. 30-34
Citations number
9
Categorie Soggetti
Material Science
ISSN journal
09259635
Volume
3
Issue
1-2
Year of publication
1994
Pages
30 - 34
Database
ISI
SICI code
0925-9635(1994)3:1-2<30:FOOCOS>2.0.ZU;2-A
Abstract
The current-voltage (I-V) characteristics and the contact resistance R (e) of Au/, Al/ and Mg/chemically vapour deposited semiconducting diam ond contacts were measured. The I-V characteristics of Al/ and Mg/p-di amond contacts changed their properties from an ohmic to a rectifying nature as the resistivity of the semiconducting diamonds increased, wh ile the Au/p-diamond contact was ohmic. An R(c) of less than 10(3) Ome ga cm(2) is found to be necessary to obtain the ohmic contacts on semi conducting diamonds regardless of the metal. The rough estimate of the barrier height phi(B), was also discussed using the results of the R( c) measurement.