CARBON-FILMS DEPOSITED BY THE PHYSICAL VAPOR-DEPOSITION FOCUSED-ARC EVAPORATION TECHNIQUE

Citation
C. Charrier et al., CARBON-FILMS DEPOSITED BY THE PHYSICAL VAPOR-DEPOSITION FOCUSED-ARC EVAPORATION TECHNIQUE, DIAMOND AND RELATED MATERIALS, 3(1-2), 1994, pp. 41-46
Citations number
13
Categorie Soggetti
Material Science
ISSN journal
09259635
Volume
3
Issue
1-2
Year of publication
1994
Pages
41 - 46
Database
ISI
SICI code
0925-9635(1994)3:1-2<41:CDBTPV>2.0.ZU;2-V
Abstract
Diamond-like carbon was physically vapour deposited on various substra tes using an enhanced cathodic are plasma in Ar, H-2 and/or CH4. The e nhanced evaporator allows diamond-like coating deposition with a bette r surface finish than a conventional vacuum are system does; the size of the macroparticles did not exceed 0.3 mu m. Emphasis is put on the evaporator design and its capabilities. The plasma species were identi fied by optical emission spectroscopy while carbon coatings were chara cterized by scanning electron microscopy, Raman spectroscopy and elect ron spectroscopy for chemical analysis.