LOW-TEMPERATURE PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION OF AMORPHOUS-CARBON FILMS FOR BIOMEDICAL-POLYMERIC SUBSTRATES

Citation
Ir. Mccoll et al., LOW-TEMPERATURE PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION OF AMORPHOUS-CARBON FILMS FOR BIOMEDICAL-POLYMERIC SUBSTRATES, DIAMOND AND RELATED MATERIALS, 3(1-2), 1994, pp. 83-87
Citations number
7
Categorie Soggetti
Material Science
ISSN journal
09259635
Volume
3
Issue
1-2
Year of publication
1994
Pages
83 - 87
Database
ISI
SICI code
0925-9635(1994)3:1-2<83:LPCOA>2.0.ZU;2-I
Abstract
Preliminary results have been obtained on the biocompatibility of amor phous carbon hydrogen (alpha C:H) coatings deposited on polystyrene. D eposition was carried out at low substrate temperatures using pulsed r .f. plasma-assisted chemical vapour deposition from a methane-hydrogen gas mixture. Cytotoxicity tests using a standard cell line indicate a high degree of biocompatibility. Specifically, alpha C:H is not toxic to cells, appears to increase cell attachment and affords normal cell growth rates. Wear and other tests have revealed no significant diffe rences between these alpha C:H coatings and those deposited on a stain less steel at a higher substrate temperature, except for a more pronou nced surface texture. However, position in the r.f. plasma was found t o be critical for the deposition of good, adherent low temperature coa tings.