THE CHEMICAL BASIS OF THE C-H-O PHASE-DIAGRAM IN DIAMOND PLASMA DEPOSITIONS

Citation
I. Pinter et al., THE CHEMICAL BASIS OF THE C-H-O PHASE-DIAGRAM IN DIAMOND PLASMA DEPOSITIONS, DIAMOND AND RELATED MATERIALS, 3(1-2), 1994, pp. 126-128
Citations number
20
Categorie Soggetti
Material Science
ISSN journal
09259635
Volume
3
Issue
1-2
Year of publication
1994
Pages
126 - 128
Database
ISI
SICI code
0925-9635(1994)3:1-2<126:TCBOTC>2.0.ZU;2-Q
Abstract
The chemical origin of the C-H-O phase diagram of diamond plasma depos ition methods has been presented. According to the suggested chemical reactions, in almost all C-H-O-gas-containing plasmas the principal re actions begin with carbon removal by oxygen to the very stable CO. The rest of the gases during diamond deposition can be regarded as basica lly the same with the first successful diamond plasma consisting of a Few per cent of hydrocarbons diluted in hydrogen gas. The suggested re actions result in successful diamond depositions only above the H-CO l ine in the C-H-O phase diagram.