Novel photocrosslinkable polymethacrylate systems with enhanced therma
l stability and solvent resistance were synthesized. Copolymers of met
hyl methacrylate (MMA) or butyl acrylate (BuA) with 4-maleimido benzoi
c acid (MBA) were synthesized and photocrosslinkable methacrylic funct
ions were incorporated through the pendent COOH groups. Photofunctiona
l groups were introduced by the acid chloride route and by the epoxy-c
arboxy reaction. Photocrosslinking was performed using UV radiation of
350 nm in the presence of a photo-initiator. The kinetics of photocur
ing was studied with a model multiacrylate. The imide-modified photocu
red acrylate polymer exhibited enhanced solvent resistance and thermal
stability, compared with the unmodified polymer.