A new type of multiple quantum well (MQW) reflection modulator, based
on the multilayer active antireflection coating (A-ARC) is proposed an
d compared theoretically with the conventional MQW modulator based on
the asymmetric Fabry-Perot etalon (AFP). It is shown that both a large
on-off ratio and a low operating voltage can be achieved. It will be
demonstrated that the A-ARC device matches the performance of the rece
ntly reported asymmetric Fabry-Perot modulator while requiring smaller
device thickness. It will also be shown that A-ARC MQW modulators exh
ibit superior tolerance to the unavoidable thickness variations, this
allowing fabrication of large-area uniform arrays of modulators.