OSCILLATORY BEHAVIOR OF THE MAGNETORESISTANCE VERSUS CU SPACER THICKNESS IN UHV-GROWN CO CU(111) MULTILAYERS/

Authors
DUPAS C KOLB E LEDANG K RENARD JP VEILLET P VELU E RENARD D
Citation
C. Dupas et al., OSCILLATORY BEHAVIOR OF THE MAGNETORESISTANCE VERSUS CU SPACER THICKNESS IN UHV-GROWN CO CU(111) MULTILAYERS/, Journal of magnetism and magnetic materials, 128(3), 1993, pp. 361-364
Citations number
21
Categorie Soggetti
Material Science","Physics, Condensed Matter
Journal title
Journal of magnetism and magnetic materials → ACNP
ISSN journal
03048853
Volume
128
Issue
3
Year of publication
1993
Pages
361 - 364
Database
ISI
SICI code
0304-8853(1993)128:3<361:OBOTMV>2.0.ZU;2-J
Abstract
The magnetoresistance of Au-3/Cu-0.3/Co-1.2/Cu-t/Co-1.2/Cu-0.3/Au-25(1 11) multilayers (the numbers indicate the thickness in nanometers) gro wn by evaporation in UHV has been investigated between 1.4 and 300 K. By using a stepped wedge-shaped middle Cu layer, eight different t val ues could be obtained in a single sample. The MR exhibits an oscillato ry behaviour up to t = 3.4 nm with a period of 0.8-1 nm, which is cons istent with the predictions of RKKY theory for oscillatory interlayer coupling across Cu(111).