IN-SITU PHOTOLUMINESCENCE AND PHOTOMODULATED INFRARED STUDY OF POROUSSILICON DURING ETCHING AND IN AMBIENT

Citation
Vm. Dubin et al., IN-SITU PHOTOLUMINESCENCE AND PHOTOMODULATED INFRARED STUDY OF POROUSSILICON DURING ETCHING AND IN AMBIENT, Journal of luminescence, 57(1-6), 1993, pp. 61-65
Citations number
19
Categorie Soggetti
Optics
Journal title
ISSN journal
00222313
Volume
57
Issue
1-6
Year of publication
1993
Pages
61 - 65
Database
ISI
SICI code
0022-2313(1993)57:1-6<61:IPAPIS>2.0.ZU;2-H
Abstract
Porous silicon etched in HF without air exposure after preparation doe s not exhibit the well-known red photoluminescence, but a weak yellow- green emission is observed instead. The electron states whose populati on is affected by light excitation have been investigated using photom odulated infrared spectroscopy. For the yellow-green luminescent sampl es in HF, the photoinduced infrared absorption has a shape typical of free carriers; it is very large and appears correlated with photolumin escence intensity, suggesting that the yellow-green photoluminescence is due to direct recombination of the photocreated free carriers. For air-exposed red luminescent samples, the photoinduced infrared absorpt ion is much weaker, and its shape exhibits an extra absorption in the 1500-3000cm(-1) region, suggesting that the red luminescence occurs th rough carriers trapped in localized states.