Vm. Dubin et al., IN-SITU PHOTOLUMINESCENCE AND PHOTOMODULATED INFRARED STUDY OF POROUSSILICON DURING ETCHING AND IN AMBIENT, Journal of luminescence, 57(1-6), 1993, pp. 61-65
Porous silicon etched in HF without air exposure after preparation doe
s not exhibit the well-known red photoluminescence, but a weak yellow-
green emission is observed instead. The electron states whose populati
on is affected by light excitation have been investigated using photom
odulated infrared spectroscopy. For the yellow-green luminescent sampl
es in HF, the photoinduced infrared absorption has a shape typical of
free carriers; it is very large and appears correlated with photolumin
escence intensity, suggesting that the yellow-green photoluminescence
is due to direct recombination of the photocreated free carriers. For
air-exposed red luminescent samples, the photoinduced infrared absorpt
ion is much weaker, and its shape exhibits an extra absorption in the
1500-3000cm(-1) region, suggesting that the red luminescence occurs th
rough carriers trapped in localized states.