TRANSIENT PHOTOLUMINESCENCE DECAY IN POROUS SILICON AND SILOXENE

Citation
S. Finkbeiner et al., TRANSIENT PHOTOLUMINESCENCE DECAY IN POROUS SILICON AND SILOXENE, Journal of luminescence, 57(1-6), 1993, pp. 231-234
Citations number
17
Categorie Soggetti
Optics
Journal title
ISSN journal
00222313
Volume
57
Issue
1-6
Year of publication
1993
Pages
231 - 234
Database
ISI
SICI code
0022-2313(1993)57:1-6<231:TPDIPS>2.0.ZU;2-B
Abstract
The photoluminescence decay after laser pulse excitation is studied in porous silicon and siloxene as a function of sample temperature, dete ction wavelength, laser intensity, and pulse length. The time dependen ce in all samples is characterized by a nonexponential decay directly after the laser excitation and a single exponential decay for long tim es after the laser pulse. The exponential decay is identical for the p orous silicon samples and annealed siloxene and depends only on detect ion wavelength and sample temperature. As prepared siloxene exhibits t he same decay characteristics. However, the nonexponential decay is mo re pronounced and the single exponential decay is a factor of 2-5 fast er compared with annealed siloxene. The decay of the photoluminescence is another indication of the identical origin of the strong visible l uminescence in porous Si and in annealed siloxene.