DOMAIN-WALL MOTION IN RE-TM FILMS WITH DIFFERENT THICKNESS

A thermally activated domain wall motion was studied in amorphous TbFe films with different thickness. The activation energy of the domain w all displacement process was determined for the films with various com position and thickness; it is about 2.5 eV. The activation volume of t his process nonlinearly increases from 2x10(-18) cm3 to 7x10(-18) cm3 as the film thickness increases from 25 nm to 400 nm. The change of th e domain shape with the film thickness growth and domain wall coercive force dependence on film thickness are discussed in terms of thermoac tivated domain wall motion.