MAGNETOSTRICTION OF SPUTTERED SM-FE THIN-FILMS
Citation
T. Honda et al., MAGNETOSTRICTION OF SPUTTERED SM-FE THIN-FILMS, IEEE transactions on magnetics, 29(6), 1993, pp. 3126-3131
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
SICI code
0018-9464(1993)29:6<3126:MOSST>2.0.ZU;2-A
Abstract
The magnetostriction and the magnetic properties of amorphous SmxFe100
-x thin films prepared by sputtering were investigated at room tempera
ture. The magnetostriction, -lambda, of these films increased rapidly
in low fields (<1kOe) and reached the maximum values of 300-400x10(-6)
at 16kOe for x=30-40. These results suggest that Sm-Fe thin films cou
ld be used for micro-actuators. The magnetic properties of Sm-Fe thin
films did not show clear dependence on the sputtering conditions such
as input power, Ar gas pressure, and substrate temperature.