AN APPROACH FOR NANOLITHOGRAPHY USING ELECTRON HOLOGRAPHY

A technique of electron holography was applied to nanofabrication. Ele ctron interference fringes whose spacing was 108 nm were successfully recorded on polymethylmethacrylate (PMMA) resist using a W[100] therma l field emission (TFE) gun and an electron biprism both set on a conve ntional transmission electron microscope (TEM). Furthermore, we have a ttempted the fabrication of a free-standing multi-biprism by electron beam lithography and dry etching, leading to a new fabrication method of a nanoscale grating with a short exposure.