THE REQUIREMENTS FOR FUTURE ELECTRON-BEAM RETICLE FABRICATION SYSTEMSFROM AN ERROR ANALYSIS VIEWPOINT

To pave the way for giga-scale reticle, fabrication, error analysis in the development of an electron-beam reticle fabrication system for 0. 3 mum production and 0.2 mum development of devices is re-examined. To improve the stitching accuracy, it is necessary to constrain some kin ds of mechanical vibration. For higher pattern width accuracy, higher accelerating voltage and thorough proximity correction are needed. To realize ultimate positioning accuracy, it is important to control fluc tuation in reticle temperature precisely. The analysis results strongl y suggest that it is necessary to constrain environmental disturbances . Control technology that minimizes the influence of disturbances and a design strategy established from this guideline will be needed in th e not so distant future. This paper discusses requirements of a giga-s cale electron-beam reticle fabrication system from an error-analysis v iewpoint.