GAAS ALAS TRENCH-BURIED QUANTUM WIRES (LESS-THAN-20NMX20NM) FABRICATED BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION ON NONPLANAR SUBSTRATES/

Citation
T. Sogawa et al., GAAS ALAS TRENCH-BURIED QUANTUM WIRES (LESS-THAN-20NMX20NM) FABRICATED BY METALORGANIC CHEMICAL-VAPOR-DEPOSITION ON NONPLANAR SUBSTRATES/, JPN J A P 1, 32(12B), 1993, pp. 6224-6227
Citations number
18
Categorie Soggetti
Physics, Applied
Volume
32
Issue
12B
Year of publication
1993
Pages
6224 - 6227
Database
ISI
SICI code
Abstract
We report the fabrication of quantum wires buried in U-grooved trenche s grown by metalorganic chemical vapor deposition on V-grooved (001) s ubstrates. These trench structures with vertical (110) sidewalls were formed as a result of the faceting of (110) planes, and lateral growth of these planes reduced the trench width to less than 20 nm. A cross- sectional scanning electron micrograph shows that these trench-buried structures have GaAs wires of about 20 nm lateral width. Photoluminesc ence (PL) blue shifts and strong PL anisotropy confirm two-dimensional quantum confinement.