ENERGIES FOR ATOMIC EMISSIONS FROM DEFECT SITES ON THE SI SURFACES - THE EFFECTS OF HALOGEN ADSORBATES

Citation
Gs. Khoo et al., ENERGIES FOR ATOMIC EMISSIONS FROM DEFECT SITES ON THE SI SURFACES - THE EFFECTS OF HALOGEN ADSORBATES, Journal of applied physics, 75(1), 1994, pp. 255-258
Citations number
35
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00218979
Volume
75
Issue
1
Year of publication
1994
Pages
255 - 258
Database
ISI
SICI code
0021-8979(1994)75:1<255:EFAEFD>2.0.ZU;2-U
Abstract
A study was made of the energies for ejection of Si atoms and SiCl mol ecules from defect sites on Si (100) and (110) surfaces, including ada toms, kinks, and vacancies, with and without interaction with Cl adsor bates. It is found that the energies for emitting a Si atom from defec t sites are smaller than those for the perfect site and almost proport ional to the coordination number for the Si (110) surface. It is also found that the interaction of Cl with defects reduces the energy for t he ejection of a Si atom and a SiCl molecule, depending on the adsorpt ion site.