Y. Satoh et al., EFFECT OF BULK MICRODEFECTS INDUCED IN HEAT-TREATED CZOCHRALSKI SILICON ON DIELECTRIC-BREAKDOWN OF THERMAL SIO2-FILMS, Applied physics letters, 64(3), 1994, pp. 303-305
We examine the effect of bulk microdefects (BMD) intentionally introdu
ced in Czochralski silicon substrates by heat treatment on the dielect
ric breakdown of thermally grown SiO2 films. Transmission electron mic
roscope observations reveal that the BMD consist of oxygen precipitate
s, perfect dislocation loops, and faulted dislocation loops. When the
BMD are incorporated into the SiO2 film during thermal oxidation, an a
pparent decrease in the breakdown field is observed. The size of the o
xygen precipitates has a clear relationship with the breakdown field:
larger oxygen precipitate causes greater degradation. The dislocation
loops are unrelated to the breakdown field.