LASER POLYMER ABLATION THRESHOLD LOWERED BY NANOMETER HOT-SPOTS

Citation
Xn. Wen et al., LASER POLYMER ABLATION THRESHOLD LOWERED BY NANOMETER HOT-SPOTS, Applied physics letters, 64(2), 1994, pp. 184-186
Citations number
12
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
64
Issue
2
Year of publication
1994
Pages
184 - 186
Database
ISI
SICI code
0003-6951(1994)64:2<184:LPATLB>2.0.ZU;2-Y
Abstract
The effects of nanometer-sized hot spots on laser polymer ablation are studied. Two polymer thin films are synthesized, containing sensitize rs which absorb intense 1.064 mu m optical pulses. One film contains a molecular dye sensitizer. The other contains graphic nanoparticle sen sitizers (less than or equal to 220 nm diam). When longer duration pul ses (150 ns) which do not produce hot spots are used, bath films have the same ablation threshold. When shorter (23 ps) pulses are used, the ablation threshold for graphite films is a factor of 3 less than in d ye films, attributed to enhanced polymer thermal decomposition in the vicinity of the larger graphite hot spot.