The molecular orientation of nematic 5CB on various solid substrates e
roded obliquely by an Ar+ ion-beam has been studied experimentally. Th
e sputtering on an isotropic substrate (normally evaporated SiO) resul
ts in a nematic planar orientation along the projection of the local v
elocity of the ion direction on the surface. When using an anisotropic
substrate (obliquely evaporated SiO which gives planar orientation in
absence of sputtering) we find a continuous twist of the resulting al
ignment, from the initial planar orientation towards the beam track pr
ojection. Although the geometry allows it, we do not observe any surfa
ce orientation bistability.