M. Zlatanovic et al., SUBSTRATE-INDUCED CHANGES OF TIN AND (TI,AL)N COATINGS DUE TO PLASMA NITRIDING, Surface & coatings technology, 63(1), 1994, pp. 35-41
Some properties of TiN and (Ti, AI)N coatings deposited on plasma-nitr
ided samples made of steel grades AISI M2 and AISI H11 were analyzed.
In all composite plasma-nitrided/hard-coating layer structures the coa
ting-to-substrate adhesion was enhanced compared with the adhesion of
the coatings deposited on non-nitrided specimens. The mechanism of a c
oating failure during the scratch test is influenced by plasma nitridi
ng of the substrate prior to coating deposition, and the compressive s
tresses in both TiN and (Ti, Al)N coatings are increased. Substrate-in
duced preferred orientation growth of both coatings is also influenced
by the plasma nitriding, but (111) preferred orientation was found in
all cases. All coating structures are found to be columnar and very d
ense, the coating density being increased due to plasma nitriding of s
teel substrates. An increase of the coating surface roughness is also
due to plasma nitriding of the substrates.