L. Pranevicius et al., INITIAL-STAGES OF DEVELOPMENT OF THE SURFACE-TOPOGRAPHY INDUCED BY ION-BOMBARDMENT, Surface & coatings technology, 63(1), 1994, pp. 57-63
The development of surface topography is conducted on the basis of con
sideration of the stochastic sputtering process. Elemental, inhomogene
ous and multilayer structures are investigated. It is shown that in th
e case of multilayer structures the microscopic roughness of the surfa
ce depends significantly on the ratio of sputtering yields of contacti
ng layers and on the interface properties. It is shown that ion beams
can be employed for surface roughness control.