INITIAL-STAGES OF DEVELOPMENT OF THE SURFACE-TOPOGRAPHY INDUCED BY ION-BOMBARDMENT

Citation
L. Pranevicius et al., INITIAL-STAGES OF DEVELOPMENT OF THE SURFACE-TOPOGRAPHY INDUCED BY ION-BOMBARDMENT, Surface & coatings technology, 63(1), 1994, pp. 57-63
Citations number
14
Categorie Soggetti
Materials Science, Coatings & Films
ISSN journal
02578972
Volume
63
Issue
1
Year of publication
1994
Pages
57 - 63
Database
ISI
SICI code
0257-8972(1994)63:1<57:IODOTS>2.0.ZU;2-R
Abstract
The development of surface topography is conducted on the basis of con sideration of the stochastic sputtering process. Elemental, inhomogene ous and multilayer structures are investigated. It is shown that in th e case of multilayer structures the microscopic roughness of the surfa ce depends significantly on the ratio of sputtering yields of contacti ng layers and on the interface properties. It is shown that ion beams can be employed for surface roughness control.