LASER-INDUCED DAMAGE RESISTANCE OF THIN-FILM POLARIZERS PREPARED BY ION-ASSISTED DEPOSITION

Authors
GU PF TANG JF
Citation
Pf. Gu et Jf. Tang, LASER-INDUCED DAMAGE RESISTANCE OF THIN-FILM POLARIZERS PREPARED BY ION-ASSISTED DEPOSITION, Optics letters, 19(2), 1994, pp. 81-83
Citations number
5
Categorie Soggetti
Optics
Journal title
Optics letters → ACNP
ISSN journal
01469592
Volume
19
Issue
2
Year of publication
1994
Pages
81 - 83
Database
ISI
SICI code
0146-9592(1994)19:2<81:LDROTP>2.0.ZU;2-A
Abstract
An investigation of the effects of ion-assisted deposition on the lase r-induced damage threshold of thin-film polarizers has been carried ou t. It shows that the laser-induced damage threshold of polarizers with 50-100-eV oxygen-ion bombardment during deposition is improved consid erably.