INTERACTIONS IN COPTCR SIO2 COMPOSITE THIN-FILMS/

Authors
ELHILO M OGRADY K NGUYEN TA BAUMGART P SANDERS IL
Citation
M. Elhilo et al., INTERACTIONS IN COPTCR SIO2 COMPOSITE THIN-FILMS/, IEEE transactions on magnetics, 29(6), 1993, pp. 3724-3726
Citations number
7
Categorie Soggetti
Engineering, Eletrical & Electronic","Physics, Applied
Journal title
IEEE transactions on magnetics → ACNP
ISSN journal
00189464
Volume
29
Issue
6
Year of publication
1993
Part
2
Pages
3724 - 3726
Database
ISI
SICI code
0018-9464(1993)29:6<3724:IICSCT>2.0.ZU;2-1
Abstract
In this paper the behaviour of CoPtCr/SiO2 composite thin Alms with va riable percentages of SiO2 (0%--> 35%) is reported. From measurements of remanence curves and interaction characterisation via the delta plo t curves, films with 20%--> 24% SiO2 show a wider range of switching f ields and lower magnitude of interaction in comparison with the films containing a lower concentration of SiO2