Uniaxial anisotropy field, H-k, and local anisotropy fluctuation were
studied as a function of argon pressure during deposition for the RF s
puttered amorphous CoFeNb films. Influence of P(Ar)on H-k, K-loc and S
(structure constant) is discussed. The magnitude of S and K-loc V-1/2
were found to be strongly dependent on P-Ar.